Record Details     « New Search       Brief Record Full Record MARC Record     Bibliographic Data Control Number 77273 Date and Time of Latest Transaction 20110811104451.AM General Information 110811s |||||||||b ||00||| Cataloging Source PCASTRD-DOST Language Code eng Main Entry - Personal Name Sharp, Kenneth G.   Pernisz, Udo C.   D'errico, John J. Title Statement Electrical and optical properties of amorphous silicon films deposited from fluorodisilanes Physical Description 391-401 Summary, Etc. Hydrofluorinated amorphous silicon films have been deposited from pentafluorodisilane and 1,1,1-trifluorodisilane by chemical vapor deposition. The films and gaseous by-products of the depositions were analyzed by IR spectroscopy. The optical bandgap of the films ranged from 1.85 to 2.87 eV as determined from Tauc plots. The dark conductivity as a function of temperature was measured; room-temperature conductivities ranged from 10-13 to 10-10 S cm-1. The films demonstrated high photoconductivity under white light and a small Staebler-Wronski effect characterized by the t-1/3 law Subject Added Entry - Topical Term Hydrofluorinated amorphous silicon films   IR spectroscopy -- Materials science           Physical Location           Digital Copy Not Available          Add to Book Cart  |   Download MARC